Cathode sputtering system

Details Cathode sputtering system Cathode sputtering system

1989-07-31

1990-07-03

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 414217, 414222, C23C 1434

Patent

active

049388584

ABSTRACT:
A cathode sputtering system comprising an annularly-shaped process chamber and a correspondingly annularly-shaped substrate carrier accommodated therein. The chamber and carrier are positioned vertically. A cathode station and a loading and unloading station are positioned on vertical walls of the chamber.

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Siegle, Gert "Herstellung dunner Metallschichten durch Kathodenzerstaubung", mrv. metallpraxis/oberflachentechnik pp. 247-253.

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