Cathode sputtering apparatus with adjacently arranged stations

Details Cathode sputtering apparatus with adjacently arranged stations Cathode sputtering apparatus with adjacently arranged stations

1985-03-28

1986-06-17

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

045954836

ABSTRACT:
Cathode sputtering apparatus with at least two adjacently arranged stations including a charging station and a coating station. At least one sputtering cathode and a substrate carrier that can execute reciprocatory movement between the stations are arranged on a vacuum chamber. The substrate carrier is secured by means of an extension arm eccentrically on a pivot bearing passing through the vacuum chamber. A coolant circulation line is led through the pivot bearing to the substrate holder.

REFERENCES:
patent: 4336438 (1982-06-01), Uehara et al.
patent: 4388034 (1983-06-01), Takahashi
patent: 4444643 (1984-04-01), Garrett
patent: 4450062 (1984-05-01), Macauley
patent: 4482419 (1984-11-01), Tsukada et al.
patent: 4500407 (1985-02-01), Boys et al.
patent: 4547247 (1985-10-01), Warenback
patent: 4548699 (1985-10-01), Hutchinson et al.

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