Cathode sputtering apparatus

Details Cathode sputtering apparatus Cathode sputtering apparatus

1991-06-20

1993-04-27

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429815, 118730, C23C 1456, C23C 1450

Patent

active

052059197

ABSTRACT:
A cathode sputtering apparatus for the coating of substrates in a vacuum chamber is presented which accommodates a rotating substrate carrier, and which comprises at least one gripper which includes a hub and at least one arm with a gripper with the hub rotating around a horizontal axis; during the sputtering, two annular closing elements separate a segment in front of the station from the remaining portion of the vacuum chamber and a cathode vacuum chamber is thus formed which is separate from the vacuum chamber of the apparatus.

REFERENCES:
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4675096 (1987-06-01), Tateishi et al.
patent: 4943363 (1990-07-01), Zejda et al.

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