Cathode sputtering apparatus

Details Cathode sputtering apparatus Cathode sputtering apparatus

1977-03-18

1978-05-23

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1500

Patent

active

040909417

ABSTRACT:
Methods and apparatus for depositing a coating material on an underlying substrate are disclosed. Cathode sputtering techniques for rapidly depositing a relatively thick coating on a substrate having a complex geometry are developed. The apparatus employed includes a sputtering chamber formed between a center, post cathode and a hollow, cylindrical cathode. In one embodiment a magnetic field is imposed upon the sputtering chamber to concentrate the sputtered coating material in a preferred region.

REFERENCES:
patent: 3354074 (1967-11-01), Kay
patent: 3979273 (1976-09-01), Panzera et al.
E. D. McClanahan et al., "Initial work on the Application of Protective Coatings to Marine Gas Turbine Components by High-Rate Sputtering," ASME Publication, pp. 1-12, (1974).

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