Cathode for vacuum sputtering treatment machine

Details Cathode for vacuum sputtering treatment machine Cathode for vacuum sputtering treatment machine

2007-06-26

2007-06-26

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298090

Reexamination Certificate

active

11032378

ABSTRACT:
A cathode for a vacuum sputtering processing machine includes a target plate mounted on a support having a cooler. The support is secured to a frame delimiting a closed space for positioning and centering the target. The frame peripherally has a profiled catching rim configured to collaborate with a set of independent gripping elements having complementary catching shapes configured to allow an effect of tilting of the elements resulting from a clamping action exerted on members engaged in a thickness of the elements, and bearing against a part of the catching rim of the frame, so that, under the tilting effect, a part of the catching shapes of the set of gripping elements bears facially against a peripheral edge of the target plate to secure the target plate.

REFERENCES:
patent: 4780190 (1988-10-01), Vranken et al.
patent: 5147521 (1992-09-01), Belli et al.
patent: 5269894 (1993-12-01), Kerschbaumer
patent: 5863397 (1999-01-01), Tu et al.
patent: 295 12 094 (1996-03-01), None

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