Cathode for sputtering

Details Cathode for sputtering Cathode for sputtering

1978-12-20

1980-03-25

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1500

Patent

active

041949625

ABSTRACT:
A system for sputter coating architectural glass is disclosed which includes an evacuable enclosure, a conveyor for moving glass to be coated along parallel paths, an elongated sputtering cathode supported between the paths, and structure by which ionizable gas is introduced into the enclosure. The cathode creates a continuous band of plasma extending about it through a region defining laterally spaced first and second sections extending generally parallel to glass on respective sides of the cathode and return sections joining the ends of the laterally spaced sections. The cathode includes sputtering material target face portions extending adjacent and parallel to the plasma sections and a magnetic field directing system for constraining the plasma flow in the sections to extend substantially uniformly over the target face portions.

REFERENCES:
patent: 3414503 (1968-12-01), Brichard
patent: 3738928 (1973-06-01), Glaser et al.
patent: 3878085 (1975-04-01), Corbani
patent: 3956093 (1976-05-01), McLeod
patent: 4013532 (1977-03-01), Cormia et al.
patent: 4041353 (1977-08-01), Penfold et al.
patent: 4116806 (1978-09-01), Love et al.
patent: 4126530 (1978-11-01), Thornton

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