Coating apparatus – Gas or vapor deposition – With treating means
Patent
1981-03-16
1983-01-25
Smith, John D.
Coating apparatus
Gas or vapor deposition
With treating means
118 501, 118715, 204298, C23C 1100
Patent
active
043697305
ABSTRACT:
A cathode for use in a glow discharge chamber. A top surface electrode is adapted to provide a substantially uniform distribution of reaction gases at the active surface of an overlying substrate as it advances through the chamber. A plurality of baffles within the cathode creates equal path lengths for reaction gases from their source to the surface electrode and from the surface electrode to a vacuum. The electrode is electrically insulated from a plurality of gas exits so that the generation of plasma is confined solely to a region between the electrode and the active surface of the substrate.
REFERENCES:
patent: 3366090 (1968-06-01), Hough
patent: 3654103 (1972-04-01), Smith, Jr.
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4262631 (1981-04-01), Kubacki
Barnard Timothy J.
Gattuso David A.
Izu Masatsugu
Energy Conversion Devices Inc.
Norris Lawrence G.
Plantz Bernard F.
Smith John D.
LandOfFree
Cathode for generating a plasma does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cathode for generating a plasma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathode for generating a plasma will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1619517