Cathode for generating a plasma

Coating apparatus – Gas or vapor deposition – With treating means

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118 501, 118715, 204298, C23C 1100

Patent

active

043697305

ABSTRACT:
A cathode for use in a glow discharge chamber. A top surface electrode is adapted to provide a substantially uniform distribution of reaction gases at the active surface of an overlying substrate as it advances through the chamber. A plurality of baffles within the cathode creates equal path lengths for reaction gases from their source to the surface electrode and from the surface electrode to a vacuum. The electrode is electrically insulated from a plurality of gas exits so that the generation of plasma is confined solely to a region between the electrode and the active surface of the substrate.

REFERENCES:
patent: 3366090 (1968-06-01), Hough
patent: 3654103 (1972-04-01), Smith, Jr.
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4262631 (1981-04-01), Kubacki

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