Cathode for coating a substrate

Details Cathode for coating a substrate Cathode for coating a substrate

1993-02-22

1996-01-09

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, 20429811, 2042982, C23C 1434

Patent

active

054826101

ABSTRACT:
In a cathode system for coating a substrate (46), having a cathode which is connected to a direct-current and/or alternating-current source (high-frequency source) and is disposed in an evacuable coating chamber (2), and is electrically connected to a target (29) which is sputtered and whose sputtered particles deposit themselves on the substrate, a process gas is brought into the coating chamber. The cathode is formed from a substantially pot-like housing (3) whose solid bottom (39) is fixedly joined to the target (29) and whose open end facing away from the target (29) is sealingly held in an opening (49) in the outer wall (30) of the coating chamber such that the interior (49) of the housing (3) is exposed to atmospheric pressure, while the target (29) and the outer surface of the shell-like part of the housing (3) joined thereto are affected by the pressure prevailing in the coating chamber.

REFERENCES:
patent: 4169031 (1979-09-01), Brors
patent: 4198283 (1980-04-01), Class et al.
patent: 4340462 (1982-07-01), Koch
patent: 4426264 (1984-01-01), Munz et al.
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4734183 (1988-03-01), Wirz et al.
patent: 4810346 (1989-03-01), Wolf et al.
patent: 4927513 (1990-05-01), Schultheiss et al.
patent: 5006219 (1991-04-01), Latz et al.
Yoshiro Niimura; Masahiko Naoe: Sputter deposition of Co-Cr thin-film media on high-speed rotating disk. In: J. Vac. Sci. Technol. A5 (2) Mar./Apr. 1987, pp. 191-195.
Matsuoka, M.: et al: Preparation of ba-ferrite films for perpendicular magnetic recording by RF targets facing type of sputtering. In: IEEE Transactions on Mangetics, vol. MAG-20, No. 5, Sep. 1984, pp. 800-802.

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