Chemistry: electrical and wave energy – Processes and products
Patent
1981-12-09
1983-05-24
Andrews, R. L.
Chemistry: electrical and wave energy
Processes and products
204128, 204252, 204290R, 204290F, 204293, C25B 134, C25B 1106, C25B 1110
Patent
active
043849326
ABSTRACT:
An improved cathode with a conductive metal core and a Raney nickel type catalytic surface predominantly derived from an adherent Beta (NiAl.sub.3) crystalline precursory outer portion of the metal core is disclosed. The precursory outer portion contains nickel, tantalum, and aluminum to give a precursor alloy having the formula (NiTa)Al.sub.3 where the tantalum content of the nickel-tantalum portion is in the range of from about 5 to about 25 weight percent. Also disclosed is a method of producing a low overvoltage cathode which includes the steps of coating a nickel-tantalum core or substrate having from about 5 to about 25 percent by weight of tantalum with molten aluminum and heat treating the coated substrate to form a (NiTa)Al.sub.3 ternary alloy with predominantly a Beta crystal structure on the outer portion. An alkali metal hydroxide is used to leach out aluminum and produce a porous binary Raney Ni-Ta alloy surface. The resulting porous binary alloy-coated substrate is useful as a cathode in electrolytic cells, particularly in membrane cells utilized to produce chlorine and caustic from brine.
REFERENCES:
patent: 4049841 (1977-09-01), Coker et al.
patent: 4116804 (1978-09-01), Needes
patent: 4169025 (1979-09-01), Needes
patent: 4240895 (1980-12-01), Gray
patent: 4248680 (1981-02-01), Carlin et al.
patent: 4251478 (1981-02-01), Welch et al.
Andrews R. L.
Clements Donald F.
Oaks Arthur E.
Olin Corporation
LandOfFree
Cathode for chlor-alkali cells does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cathode for chlor-alkali cells, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathode for chlor-alkali cells will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2145180