Electric lamp and discharge devices – With support and/or spacing structure for electrode and/or... – For indirectly heated cathode
Patent
1998-04-21
2000-04-25
Patel, Ashok
Electric lamp and discharge devices
With support and/or spacing structure for electrode and/or...
For indirectly heated cathode
313346R, 313346DC, H01J 194
Patent
active
060548002
ABSTRACT:
The present invention discloses a cathode for an electron gun comprising a base metal mainly composed of nickel and containing one kind of reducing element at least, a metal layer mainly composed of tungsten, tungsten-nickel, or zirconium-tungsten on the upper side of the base metal, and an electron emitting material layer containing alkaline earth metal oxide including barium at least on the upper side of the metal layer. The metal layer is formed by spreading tungsten, tungsten-nickel, or zirconium-tungsten on the base metal and heating it to have particle smaller than that of the base metal, to increase its life cycle under a high current density load by ensuring a diffusion route of reducing element steadily, used for good generation of free radical barium atom.
REFERENCES:
patent: 4291252 (1981-09-01), Aida et al.
patent: 4404492 (1983-09-01), Patty
patent: 4471260 (1984-09-01), Hasker et al.
patent: 4924137 (1990-05-01), Watanabe et al.
patent: 5059856 (1991-10-01), Derks
patent: 5075589 (1991-12-01), Derks et al.
patent: 5118984 (1992-06-01), Saito et al.
patent: 5146131 (1992-09-01), Derks
patent: 5347194 (1994-09-01), Derks
patent: 5592043 (1997-01-01), Gartner et al.
patent: 5698937 (1997-12-01), Ju et al.
Choi Jong-seo
Joo Gyu-Nam
Kim Yoon-Chang
Patel Ashok
Samsung Display Devices Co. Ltd.
LandOfFree
Cathode for an electron gun does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cathode for an electron gun, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathode for an electron gun will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-995708