Cathode assembly for cathodic sputtering apparatus

Details Cathode assembly for cathodic sputtering apparatus Cathode assembly for cathodic sputtering apparatus

1992-04-29

1993-12-14

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429812, C23C 1434

Patent

active

052698998

ABSTRACT:
Elastic and plastic deformation of backing plate members in target-backing plate cathode assemblies for cathodic sputter coating apparatus are minimized by the provision of a concave surface portion located at the target/backing plate interface and by provision of a backing plate material having a yield strength of at least about 35 ksi.

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