Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-07-08
1997-11-04
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429812, 20429819, 2042982, C23C 1434
Patent
active
056835604
ABSTRACT:
A magnetic yoke (22,23) carrying rows of permanent magnets (33,34) and a target (49,50) is connected to a top plate (41,42) by spring bolts (67) which urge the yoke toward the top plate. Rotatable cams (43,44) between the top plate and the yoke are used to adjust the distance between the top plate and the yoke. Clamping bars (37,38) having a claw-like edge parts (59-66) limit the maximum distance and, in a preferred embodiment, hold the target against the yoke.
REFERENCES:
patent: 5292419 (1994-03-01), Moses et al.
patent: 5421978 (1995-06-01), Schuhmacher et al.
Hieber, K. "Radio Frequency Sputter Deposition of Alloy Films" Siemens Forsch, Ber. Bd. 11, 1982 No. 3 pp. 145-148.
Takakazu, Tadahishi et al. "High Rate and Low Temperature Deposition of Co-Cr Films" Jap. Journal of Applied Physics, vol. 24 No. 9 (1985).
Marquardt Dietmar
Szczyrbowski Joachim
Balzers Und Leybold Deutschland Holding AG
Breneman R. Bruce
McDonald Rodney G.
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