Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-11-07
1997-04-01
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429819, 20429812, 20429816, 20429826, 20429829, C23C 1434
Patent
active
056162260
ABSTRACT:
A pair of parallel elongate targets are fixed with respect to respective plates mounted in a vacuum chamber by means of clamps arranged along the longitudinal sides of each target, and an expandable wedge system between the rear plate and magnetic yokes on the backs of the targets. The wedge system for each target includes a wedge block having ramped surfaces which face outward, a pair of wedge jaws having ramped surfaces which slide against the ramped surfaces of the block, and a screw which draws the jaws together against the ramped surfaces of the block to expand the system and force the plate away from the yoke and fix the entire assembly in the clamps.
REFERENCES:
patent: 5292419 (1989-03-01), Moses et al.
patent: 5482610 (1996-01-01), Wolf et al.
Kunz Hans
Marquardt Dietmar
Sauer Andreas
Schuhmacher Manfred
Szczyrbowski Joachim
Balzers Und Leybold Deutschland Holding AG
McDonald Rodney G.
Nguyen Nam
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