Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1988-03-14
1989-07-18
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419238, 427 37, C23C 1428, C23C 1432
Patent
active
048490881
ABSTRACT:
Cathode arc discharge evaporating device having a body of revolution as cathode. The target surface is arranged at the outside surface of the body of revolution. To control movement of the arc spot a magnetic field generating device is provided inside the body of revolution, which may be moveable with respect to the cathode.
REFERENCES:
patent: 4221652 (1980-09-01), Kuriyama
patent: 4492845 (1985-01-01), Kljuchko et al.
patent: 4673477 (1987-06-01), Ramalingam et al.
Journal of Vacuum Science & Technology/A. vol. 4, No. 3, part 1, May-Jun. 1986, pp. 388-392, American Vacuum Society, Woodbury, N.Y., U.S.A.
M. Wright et al.: "Design Advances and Applications of the Rotatable Cylindrical Magnetron".
Instruments and Experimental Techniques, vol. 19, #4, part 2, Jul./Aug. 1976, pp. 1211-1213.
Buil Boudewijn J. A. M.
Veltrop Hans
Wesemeyer Harald
Hauzer Holding B.V.
Weisstuch Aaron
LandOfFree
Cathode arc discharge evaporating device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cathode arc discharge evaporating device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathode arc discharge evaporating device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-169662