Cathode active material, method of manufacturing the same,...

Details Cathode active material, method of manufacturing the same,... Cathode active material, method of manufacturing the same,...

2007-03-13

2010-06-01

Rhee, Jane (Department: 1795)

Chemistry: electrical current producing apparatus, product, and

Current producing cell, elements, subcombinations and...

Electrode

C429S231200, C429S231600, C429S231500, C429S221000, C429S224000

Reexamination Certificate

active

07727673

ABSTRACT:
A cathode active material capable of further improving chemical stability, a method of manufacturing the cathode active material, and a battery using the cathode active material are provided. The cathode includes a cathode active material in which a coating layer made of a compound including Li, at least one selected from Ni and Mg, and O is arranged on complex oxide particles represented by Li1+xCo1−yMyO2−z, where M is at least one kind selected from the group consisting of Mg, Al, B, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Mo, Sn, W, Zr, Y, Nb, Ca and Sr, and the values of x, y and z are within a range of −0.10≦x≦0.10, 0≦y<0.50 and −0.10≦z≦0.20, respectively. A surface layer made of an oxide including at least one kind selected from the group consisting of Ti, Si, Mg and Zr is formed on the coating layer.

REFERENCES:
patent: 5677083 (1997-10-01), Tomiyama
patent: 6916580 (2005-07-01), Cho et al.
patent: 2002/0071991 (2002-06-01), Kweon et al.
patent: 62-090863 (1987-04-01), None
patent: 09-265985 (1997-10-01), None
patent: 11-071114 (1999-03-01), None

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