Catch-pin water support for process chamber

Details Catch-pin water support for process chamber Catch-pin water support for process chamber

2005-03-08

2005-03-08

Underwood, Donald W. (Department: 3652)

Material or article handling

Horizontally swinging load support

Swinging about pivot

C294S116000, C269S268000, C279S002090, C279S004120, C279S110000

Reexamination Certificate

active

06863491

ABSTRACT:
A new and improved wafer support for supporting wafers in a process chamber such as an edge bead removal (EBR) chamber. The wafer support comprises multiple wafer support units each including a gripper block that engages an edge portion or bevel of the wafer. The gripper block is attached to an engaging and disengaging mechanism for selectively causing engagement of the gripper blocks with the wafer to support the wafer and disengagement of the gripper blocks from the wafer to release the wafer for removal of the wafer from the chamber. The gripper blocks contact little or none of the surface area on the patterned surface of the wafer to prevent or substantially reduce the formation of contact-induced defects on the wafer.

REFERENCES:
patent: 2807373 (1957-09-01), Couser
patent: 3123230 (1964-03-01), Oppenheimer et al.
patent: 4828276 (1989-05-01), Link et al.
patent: 5556085 (1996-09-01), Cyr

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