Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2011-08-30
2011-08-30
Lund, Jeffrie R (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C118S715000
Reexamination Certificate
active
08006639
ABSTRACT:
The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
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Huh Myung-Soo
Kim Han-Ki
Kim Myoung-Soo
Lee Kyu-Sung
Bushnell , Esq. Robert E.
Lund Jeffrie R
Samsung Mobile Display Co., Ltd.
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