Catalytic deposition of semiconductors

Details Catalytic deposition of semiconductors Catalytic deposition of semiconductors

1987-01-28

1989-10-10

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 451, 427 58, 437173, B05D 306

Patent

active

048731196

ABSTRACT:
The invention provides a method for preparing amorphous semiconductors by (a) activating a semiconductane gas using a activator to produce mononuclear, reactive fragments or gaseous condensation products which serve as precursors for the deposition of an amorphous semiconductor; and (b) controlling the temperature of the activator and the flow rate and temperature of the semiconductane gas so that it does not completely decompose upon the activator.

REFERENCES:
patent: 4532199 (1985-07-01), Cleno et al.

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