Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing
Reexamination Certificate
2008-01-29
2008-01-29
Nguyen, Cam N. (Department: 1754)
Organic compounds -- part of the class 532-570 series
Organic compounds
Silicon containing
C502S224000, C502S343000, C502S345000, C423S24000R, C423S341000, C423S342000
Reexamination Certificate
active
11083893
ABSTRACT:
The present invention provides a catalyst that may be used to facilitate the formation of dimethylchlorosilanes. A catalyst in which copper oxide and zinc oxide are in intimate contact and form agglomerated particles allows for the increased selectively of the production of dimethylchlorosilanes.
REFERENCES:
patent: 3927121 (1975-12-01), Grane et al.
patent: 4504596 (1985-03-01), Schoepe et al.
patent: 4520130 (1985-05-01), Hashiguchi et al.
patent: 4547482 (1985-10-01), Osugi et al.
patent: 4666945 (1987-05-01), Osugi et al.
patent: 4863894 (1989-09-01), Chinchen et al.
patent: 4962220 (1990-10-01), Halm et al.
patent: 4966986 (1990-10-01), Halm et al.
patent: 4996181 (1991-02-01), Denny et al.
patent: 5512662 (1996-04-01), Kalchauer et al.
patent: 5691268 (1997-11-01), Koveal et al.
patent: 5853681 (1998-12-01), Denny et al.
patent: 5990040 (1999-11-01), Hu et al.
patent: 6069266 (2000-05-01), Kalchauer et al.
patent: 6080699 (2000-06-01), Pohl et al.
patent: 6395244 (2002-05-01), Hartweg et al.
PCT International Search Report, PCT/US2004/020462, Mar. 27, 2005.
Barr Mark Kromer
Murphy Thomas Matthew
Williams Michael Glenn
Kalow & Springut LLP
Locke, Esq. Scott D.
Nguyen Cam N.
SCM Metal Products Inc.
LandOfFree
Catalysts for the production of methylchlorosilanes using... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Catalysts for the production of methylchlorosilanes using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Catalysts for the production of methylchlorosilanes using... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3951036