Catalyst systems for the one step gas phase production of acetic

Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acids and salts thereof

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C07C 5116

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active

060282215

ABSTRACT:
A mixed metal oxide catalytic system comprising MoVNbPd or MoLaVPd providing higher selectivity and space time yield of acetic acid in the low temperature single stage oxidation of ethylene with molecular oxygen-containing gas and steam with very minimum or without the production of side products such as acetaldehyde, and methods of using the same.

REFERENCES:
patent: 3057915 (1962-10-01), Riemenschneider et al.
patent: 3131223 (1964-04-01), Smidt et al.
patent: 3240805 (1966-03-01), Naglieri
patent: 3301905 (1967-01-01), Riemenschneider et al.
patent: 4148757 (1979-04-01), Brazdil et al.
patent: 4250346 (1981-02-01), Young et al.
patent: 4339355 (1982-07-01), Decker et al.
patent: 4524236 (1985-06-01), McCain
patent: 4568790 (1986-02-01), McCain
patent: 4596787 (1986-06-01), Manyik et al.
patent: 4899003 (1990-02-01), Manyik et al.
patent: 5049692 (1991-09-01), Hatano et al.
patent: 5162578 (1992-11-01), McCain, Jr. et al.
patent: 5198580 (1993-03-01), Bartek et al.
patent: 5300682 (1994-04-01), Blum et al.
E.M. Thorsteinson et al. "The Oxidative Dehydrogenetion of Ethane . . . " Journal of Catalysis vol. 52, pp. 116-132 (1978).

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