Catalyst enhanced chemical vapor deposition apparatus

Details Catalyst enhanced chemical vapor deposition apparatus Catalyst enhanced chemical vapor deposition apparatus

2011-05-17

2011-05-17

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

C156S345100

Reexamination Certificate

active

07942968

ABSTRACT:
A catalyst enhanced chemical vapor deposition (CECVD) apparatus is provided in which the showerhead and catalyst support are separated from each other. The CECVD apparatus has excellent spacing between the showerhead, catalyst wire and substrate and can be purged to prevent contaminants from forming on parts functioning at low temperatures. The CECVD apparatus comprises a reaction chamber, a showerhead for introducing reaction gas into the reaction chamber, a catalyst wire for decomposing the reaction gas, a catalyst support for supporting the catalyst wire, a substrate on which the decomposed gas is deposited, and a substrate support for supporting the substrate.

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