Catadioptric system for photolithography

Details Catadioptric system for photolithography Catadioptric system for photolithography

1997-06-27

1998-11-10

Epps, Georgia Y.

Optical: systems and elements

Single channel simultaneously to or from plural channels

By partial reflection at beam splitting or combining surface

359727, G02B 2714, G02B 1700

Patent

active

058352759

ABSTRACT:
Catadioptric systems are provided, comprising a first imaging system, a plane mirror, and a second imaging system. The first imaging system comprises a single-pass optical system and a double-pass optical system that further comprises a concave mirror and a double-pass lens group. The second imaging system comprises a plane mirror and an aperture. The first imaging system forms an intermediate image of an object; the second imaging system re-images the intermediate image on a substrate. The catadioptric systems satisfy various conditions.

REFERENCES:
patent: 5289312 (1994-02-01), Hashimoto et al.
patent: 5515207 (1996-05-01), Foo
patent: 5668672 (1997-09-01), Oomura
patent: 5689377 (1997-11-01), Takahashi
patent: 5742436 (1998-04-01), Furter

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