Catadioptric system for photolithography

Details Catadioptric system for photolithography Catadioptric system for photolithography

1997-06-13

1998-06-23

Sugarman, Scott J.

Optical: systems and elements

Lens

With reflecting element

359730, G02B 1708

Patent

active

057711259

ABSTRACT:
Catadioptric systems are disclosed for projecting images of an object such as a mask onto a substrate. The catadioptric systems have high numerical apertures and large working distances. The catadioptric systems are useful with short-wavelength illumination and permit the object and substrate to be in parallel planes. Conditional expressions are provided for the catadioptric systems.

REFERENCES:
patent: 5402267 (1995-03-01), Furter et al.
patent: 5694241 (1997-12-01), Ishiyama et al.

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