Optical: systems and elements – Lens – With reflecting element
Patent
1998-08-11
2000-08-08
Ben, Loha
Optical: systems and elements
Lens
With reflecting element
359727, G02B 1700
Patent
active
061010472
ABSTRACT:
Provided with an optical system which is applicable to an exposure apparatus used in the manufacture of semiconductors and includes a combination of a spherical mirror having a function of refraction and lenses for astigmation control, using a CaF.sub.2 lens as the last lens, thereby making it possible to use a light source operating at a short wavelength and a wide bandwidth, enhance the life of the optical system, and transfer the enlarge pattern of a mask onto the wafer for realizing fine line width.
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Michael Hibbs, "193-nm lithograph.sub.y at MIT Lincoln Lab", Solid State Technology, Jul. 1995, pp. 69-77.
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Choi Sang Soo
Chung Hai Bin
Kim Doh Hoon
Kim Jong Soo
Lee Kag Hyeon
Ben Loha
Electronics and Telecommunications Research Institute
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