Optical: systems and elements – Lens – With reflecting element
Patent
1993-10-08
1996-07-16
Epps, Georgia Y.
Optical: systems and elements
Lens
With reflecting element
359631, G02B 1700
Patent
active
055372600
ABSTRACT:
A catadioptric optical reduction system for use in the photolithographic manufacture of semiconductors having a concave mirror operating near unit magnification, or close to a concentric condition. A lens group before the mirror provides only enough power to image the entrance pupil at infinity to the aperture stop at or near the concave mirror. A lens group after the mirror provides a larger proportion of reduction from object to image size, as well as projecting the aperture stop to an infinite exit pupil. An aspheric concave mirror is used to further reduce high order aberrations. The catadioptric optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.35 microns over a 26.times.5 millimeter field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine glasses of different refracting power to widen the spectral bandwidth which can be achieved.
REFERENCES:
patent: 3917399 (1975-11-01), Buzawa et al.
patent: 4896952 (1990-01-01), Rosenbluth
patent: 4953960 (1990-09-01), Williamson
patent: 5089913 (1992-02-01), Singh et al.
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5220454 (1993-06-01), Ichihara et al.
Bey Dawn-Marie
Epps Georgia Y.
Fattibene Paul A.
Moll Robert
SVG Lithography Systems, Inc.
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