Casting compound for semiconductor devices

Details Casting compound for semiconductor devices Casting compound for semiconductor devices

1975-04-14

1977-08-23

Jacobs, Lewis T.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C08L 6300

Patent

active

040439690

ABSTRACT:
Casting composition for semiconductor devices composed of an aliphatic, preferably cycloaliphatic polyepoxide, a dicarboxylic acid anhydride, a catalyst and a finely ground fused silica which has been surface treated, e.g., with a silazane, to replace the hydrogens of silanol groups with hydrophobic groups.

REFERENCES:
patent: 2890196 (1959-06-01), Phillips et al.
patent: 2965610 (1960-12-01), Newey
patent: 3194784 (1965-07-01), Bowen
patent: 3290165 (1966-12-01), Iannicelli
patent: 3627724 (1971-12-01), Lambert
patent: 3635743 (1972-01-01), Smith

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