Carrier head for chemical mechanical polishing

Details Carrier head for chemical mechanical polishing Carrier head for chemical mechanical polishing

2006-04-25

2006-04-25

Ackun, Jr., Jacob K. (Department: 3723)

Abrading

Machine

Rotary tool

C451S398000

Reexamination Certificate

active

07033257

ABSTRACT:
A carrier head for supporting a wafer during a chemical mechanical polishing process is provided. In one exemplary implementation, the carrier head may comprise a wear ring, and a slidably movable pressure plate disposed within the wear ring. The pressure plate may be arranged to provide slidable movement relative to the wear ring. This degree of freedom can accommodate height dimensional changes that may occur in the wear ring.

REFERENCES:
patent: 5876272 (1999-03-01), Inaba et al.
patent: 5916015 (1999-06-01), Natalicio
patent: 5931719 (1999-08-01), Nagahara et al.
patent: 6004193 (1999-12-01), Nagahara et al.
patent: 6012964 (2000-01-01), Arai et al.
patent: 6056632 (2000-05-01), Mitchel et al.
patent: 6074289 (2000-06-01), Murakami et al.
patent: 6241593 (2001-06-01), Chen et al.
patent: 6273803 (2001-08-01), Wang et al.
patent: 6290584 (2001-09-01), Kim et al.
patent: 6336853 (2002-01-01), Schultz et al.
patent: 6354928 (2002-03-01), Crevasse et al.
patent: 6361419 (2002-03-01), Zuniga et al.
patent: 6540592 (2003-04-01), Schultz et al.
patent: 6579151 (2003-06-01), Tseng et al.
patent: 6645044 (2003-11-01), Zuniga
patent: 6659850 (2003-12-01), Korovin et al.
patent: 6722964 (2004-04-01), Kimura et al.
patent: 6722965 (2004-04-01), Zuniga et al.
patent: 6726537 (2004-04-01), Crevasse et al.
patent: 6729946 (2004-05-01), Kimura
patent: 6736713 (2004-05-01), Lougher et al.

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