Caromium-tantalum oxides (Cr-TaO.sub.x), sputtering targets and

Details Caromium-tantalum oxides (Cr-TaO.sub.x), sputtering targets and Caromium-tantalum oxides (Cr-TaO.sub.x), sputtering targets and

1997-06-30

1999-11-23

Kiliman, Leszek

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428 657, 428336, 428408, 428701, 428702, 428611, 428666, 428667, 428693, 428698, 428694T, 428694TS, 428694TP, 428694TC, 428900, 427127, 427128, 427130, 427131, 2041922, 75232, 75234, 75245, 75246, G11B 566

Patent

active

059896736

ABSTRACT:
Chromium-tantalum oxides (Cr-TaO.sub.x), including chromium-tantalum pentoxide (Cr-Ta.sub.2 O.sub.5), chromium-tantalum tetrioxide (Cr-Ta.sub.2 O.sub.4 or Cr-TaO.sub.2), sputtering targets containing them, and their manufacture are disclosed. The targets are characterized by high density, uniform TaO.sub.x distribution, low impedance and stable plasma during the sputtering. The Cr-Ta oxides are used as a thin film sublayer to improve the coercivity and other characteristics of magnetic recording media deposited on metallic or non-metallic substrates used in hard disks for data storage.

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