Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant
Patent
1990-10-30
1992-03-24
Clingman, A. Lionel
Compositions
Compositions containing a single chemical reactant or plural...
Organic reactant
252170, 252171, 252153, 252364, B08B 308, CO9D 902, C11D 750
Patent
active
050985949
ABSTRACT:
Solvents having superior cleaning power include at least one polar compound having at least one strongly electro- negative oxygen, such as ethylene diacetate, and at least one alicyclic carbonate, such as ethylene carbonate, with or without other additives. The solvents exhibit low toxicity; are nonflammable, pH neutral, essentially nonvolatile, and aprotic; and have other chemical and physical properties that reduce the risk of exposing the user unnecessarily to hazardous conditions. Solvents comprising ethylene carbonate, ethylene diacetate, and, optionally, triethanolamine (TEA) and/or N-methyl-2-pyrrolidone (NMP) are superior cleaners for a wide range of residues and are environmentally and physiologically safe, and may be diluted with water for cleaning tasks that are insensitive to corrosion.
REFERENCES:
patent: 2932618 (1960-04-01), Oberdorfer
patent: 2935479 (1960-05-01), Oberdorfer
patent: 3150048 (1964-09-01), Hollub
patent: 3382181 (1968-05-01), Oberdorfer
patent: 3796602 (1974-03-01), Briney
patent: 4508634 (1985-04-01), Elepano
patent: 4617251 (1986-10-01), Sizensky
patent: 4645617 (1987-02-01), Vivian
patent: 4680133 (1987-07-01), Wand
patent: 4781916 (1988-11-01), papaphilippou
patent: 4822723 (1989-04-01), Dhillon
Clingman A. Lionel
Hammar John C.
Parks William S.
The Boeing Company
LandOfFree
Carbonate/diester based solvent does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Carbonate/diester based solvent, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Carbonate/diester based solvent will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2008009