Chemistry: electrical current producing apparatus – product – and – Having magnetic field feature
Patent
1997-07-24
1999-09-21
Kalafut, Stephen
Chemistry: electrical current producing apparatus, product, and
Having magnetic field feature
429 19, H01M 818
Patent
active
059552140
ABSTRACT:
The present invention comprises a method for lowering the carbon monoxide content of a CO-containing hydrogen-rich gas stream by contacting the gas stream with a scavenger capable of preferentially oxidizing the carbon monoxide in the gas stream and then regenerating the scavenger. The scavenger is selected from the group of mixed oxides of manganese and copper; mixed oxides of manganese and copper in combination with mixed oxides of silver, nickel, iron, and tin; mixed oxides of tin and copper; SnO.sub.2 --CuO gels; and mixtures thereof. Preferably the scavenger will have a surface area from about 0.5 to about 200 m.sup.2 /gm.
REFERENCES:
patent: 3699218 (1972-10-01), Smith et al.
patent: 3785870 (1974-01-01), Winsel
patent: 3789106 (1974-01-01), Hay
patent: 4470829 (1984-09-01), Hirai et al.
patent: 4477267 (1984-10-01), Reiss
patent: 4816353 (1989-03-01), Wertheim et al.
patent: 4861351 (1989-08-01), Nicholas et al.
patent: 5096470 (1992-03-01), Krishnamurthy
patent: 5489327 (1996-02-01), Otsuka et al.
patent: 5604047 (1997-02-01), Bellows et al.
Handbook of Fuel Cell Technology, Carl Berger, ed., 274-276, Prentice-Hall, 1968 (month N. A.).
Bellows Richard James
Robbins John Lawrence
Exxon Research and Engineering Co
Kalafut Stephen
Purwin Paul E.
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