Carbon dioxide cleaning process

Details Carbon dioxide cleaning process Carbon dioxide cleaning process

1997-07-09

1999-12-21

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 13, 134 6, 134 7, 134 26, 134 40, 134902, 451 38, 451 39, 451 75, 451102, B08B 700

Patent

active

060044004

ABSTRACT:
A method for cleaning parts employed during the processing of semiconductor wafers includes a first cleaning step for removing super-micron particles and a second cleaning step for removing sub-micron particles. The second step utilizes frozen carbon dioxide pellets and removes contaminant particles have a size of less than one micron. The cleaning method consistently removes substantially all sub-micron particles from a work surface.

REFERENCES:
patent: 4748817 (1988-06-01), Oura et al.
patent: 4932168 (1990-06-01), Tada et al.
patent: 4974375 (1990-12-01), Tada et al.
patent: 5044129 (1991-09-01), Olevitch
patent: 5125979 (1992-06-01), Swain et al.
patent: 5308404 (1994-05-01), Yam et al.
patent: 5318636 (1994-06-01), Szucs
patent: 5593339 (1997-01-01), Yam et al.

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