Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-03-06
1991-10-29
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, G01N 2726, B01D 5702
Patent
active
050613618
ABSTRACT:
A method and apparatus for increasing detector sensitivity in a Capillary Zone Electrophoresis detector is disclosed. The present invention employs a unique cell, fabricated directly into a separations capillary, that increases both the flux and the path length of the ultra-violet light employed in an absorption measurement. The cell employs controlled geometric contours and osmotic pumping to prevent laminar mixing and turbulence. This novel design maintains the resolution of the parent biological separations instrument, while affording an order of magnitude enhancement of in sensitivity. A narrow bore capillary includes an injection end and an output end. Each end is placed in a reservoir containing a buffer solution and a sample of solute. The solute comprises at least one unknown constituent component. An electric field is imposed across the buffer solution and solute in the capillary by a power supply coupled to leads and electrodes. A source of ultraviolet light illuminates a novel cell within the capillary and a sensor measures the absorbance of radiation by the solute to detect the constituent components. A computer may be coupled to absorbance detection circuitry to analyze and display the results of the identification procedure.
REFERENCES:
patent: 3623812 (1971-11-01), Hannig et al.
patent: 4459198 (1984-07-01), Mizuno et al.
patent: 4816123 (1989-03-01), Ogan et al.
patent: 4898658 (1990-02-01), Karger et al.
Hewlett--Packard Company
Niebling John F.
Starsiak Jr. John S.
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