Plastic and nonmetallic article shaping or treating: processes – Direct application of electrical or wave energy to work – Polymerizing – cross-linking – or curing
Reexamination Certificate
2003-08-21
2008-10-28
Tentoni, Leo B (Department: 1791)
Plastic and nonmetallic article shaping or treating: processes
Direct application of electrical or wave energy to work
Polymerizing, cross-linking, or curing
C264S319000
Reexamination Certificate
active
07442336
ABSTRACT:
The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
REFERENCES:
patent: 4267212 (1981-05-01), Sakawaki
patent: 4512848 (1985-04-01), Deckman et al.
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4908216 (1990-03-01), Dullings et al.
patent: 4959252 (1990-09-01), Bonnebat et al.
patent: 5028366 (1991-07-01), Harakal et al.
patent: 5110514 (1992-05-01), Soane
patent: 5132069 (1992-07-01), Newton
patent: 5206983 (1993-05-01), Guckel et al.
patent: 5240550 (1993-08-01), Boehnke et al.
patent: 5259926 (1993-11-01), Kuwabara et al.
patent: 5425848 (1995-06-01), Haisma et al.
patent: 5480047 (1996-01-01), Tanigawa et al.
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5545367 (1996-08-01), Bae et al.
patent: 5601641 (1997-02-01), Stephens
patent: 5669303 (1997-09-01), Maracas et al.
patent: 5723176 (1998-03-01), Keyworth et al.
patent: 5753014 (1998-05-01), Van Rijn
patent: 5772905 (1998-06-01), Chou
patent: 5776748 (1998-07-01), Singhvi et al.
patent: 5820769 (1998-10-01), Chou
patent: 5849209 (1998-12-01), Kindt-Larsen et al.
patent: 5849222 (1998-12-01), Jen et al.
patent: 5888650 (1999-03-01), Calhoun et al.
patent: 5900160 (1999-05-01), Whitesides et al.
patent: 5912049 (1999-06-01), Shirley
patent: 5948470 (1999-09-01), Harrison et al.
patent: 5952127 (1999-09-01), Yamanaka
patent: 5956216 (1999-09-01), Chou
patent: 6039897 (2000-03-01), Lochhead et al.
patent: 6046056 (2000-04-01), Parce et al.
patent: 6074827 (2000-06-01), Nelson et al.
patent: 6128085 (2000-10-01), Buermann et al.
patent: 6168845 (2001-01-01), Fontana, Jr. et al.
patent: 6180239 (2001-01-01), Whitesides et al.
patent: 6218316 (2001-04-01), Marsh
patent: 6234379 (2001-05-01), Donges
patent: 6274294 (2001-08-01), Hines
patent: 6309580 (2001-10-01), Chou
patent: 6316290 (2001-11-01), Wensel
patent: 6326627 (2001-12-01), Putvinski et al.
patent: 6334960 (2002-01-01), Willson et al.
patent: 6348999 (2002-02-01), Summersgill et al.
patent: 6355198 (2002-03-01), Kim et al.
patent: 6391217 (2002-05-01), Schaffer et al.
patent: 6482742 (2002-11-01), Chou
patent: 6517977 (2003-02-01), Resnick et al.
patent: 6517995 (2003-02-01), Jacobson et al.
patent: 6518168 (2003-02-01), Clem et al.
patent: 6518189 (2003-02-01), Chou
patent: 6580172 (2003-06-01), Mancini et al.
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6713238 (2004-03-01), Chou et al.
patent: 6753131 (2004-06-01), Rogers et al.
patent: 6776094 (2004-08-01), Whitesides et al.
patent: 6809356 (2004-10-01), Chou
patent: 6828244 (2004-12-01), Chou
patent: 6849558 (2005-02-01), Schaper
patent: 6900881 (2005-05-01), Sreenivasan et al.
patent: 6908861 (2005-06-01), Sreenivasan et al.
patent: 6916584 (2005-07-01), Sreenivasan et al.
patent: 7077992 (2006-07-01), Sreenivasan et al.
patent: 2002/0042027 (2002-04-01), Chou et al.
patent: 2002/0066978 (2002-06-01), Kim et al.
patent: 2002/0094496 (2002-07-01), Choi et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2002/0177319 (2002-11-01), Chou
patent: 2003/0034329 (2003-02-01), Chou
patent: 2003/0062334 (2003-04-01), Lee et al.
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0080472 (2003-05-01), Chou
patent: 2004/0007799 (2004-01-01), Choi et al.
patent: 2004/0008334 (2004-01-01), Sreenivasan et al.
patent: 2004/0009673 (2004-01-01), Sreenivasan et al.
patent: 2004/0021254 (2004-02-01), Sreenivasan et al.
patent: 2004/0021866 (2004-02-01), Watts et al.
patent: 2004/0022888 (2004-02-01), Sreenivasan et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 2004/0046288 (2004-03-01), Chou
patent: 2004/0110856 (2004-06-01), Young et al.
patent: 2004/0118809 (2004-06-01), Chou et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0131718 (2004-07-01), Chou et al.
patent: 2004/0137734 (2004-07-01), Chou et al.
patent: 2004/0156108 (2004-08-01), Chou et al.
patent: 2004/0170771 (2004-09-01), Bailey et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2004/0197843 (2004-10-01), Chou et al.
patent: 2004/0250945 (2004-12-01), Zheng et al.
patent: 2005/0037143 (2005-02-01), Chou et al.
patent: 2006/0062867 (2006-03-01), Choi et al.
patent: 2006/0076717 (2006-04-01), Sreenivasan et al.
patent: 2006/0077374 (2006-04-01), Sreenivasan et al.
patent: 2800476 (1978-07-01), None
patent: 2177342 (1987-01-01), None
patent: 1-196749 (1989-08-01), None
patent: 02-24848 (1990-01-01), None
patent: 02-92603 (1990-04-01), None
patent: 02192045 (1990-07-01), None
patent: WO 87/02935 (1987-05-01), None
patent: WO 99/05724 (1999-02-01), None
patent: WO 00/21689 (2000-04-01), None
patent: WO 01/47003 (2001-06-01), None
patent: WO 01/53889 (2001-07-01), None
patent: WO 01/63361 (2001-08-01), None
patent: WO 01/90816 (2001-11-01), None
patent: WO 02/07199 (2002-01-01), None
patent: WO 03/010289 (2003-02-01), None
patent: WO 03/079416 (2003-09-01), None
patent: WO 03/099536 (2003-12-01), None
patent: WO 2004/114016 (2004-12-01), None
Colburn et al., Step and Flash Imprint Lithography for sub-100 nm Patterning, Proceedings of SPIE vol. 3997, pp. 453-457, Jan. 1, 2000.
Johnson et al., Advances in Step and Flash Imprint Lithography, SPIE Microlithography Conference, Feb. 23, 2003.
Heidari, Nanoimprint Lithography at the 6 in. Wafer Scale, J. Vac. Sci. Technol. B 18(6), pp. 3557-3560, Nov. 1, 2000.
Translation of Japanese Patent 02-92603, (Apr. 3, 1990).
Translation of Japanese Patent 02-24848, (Jan. 26, 1990).
Chou et al., Ultrafast and Direct Imprint of Nanostructures in Silicon, Nature, col. 417, (Jun. 2002), pp. 835-837, Jun. 1, 2002.
Chou et al., Nanoimprint Lithography, Journal of Vacuum Science Technolgoy B 14(16), pp. 4129-4133, Nov. 1, 1996.
Colburn et al., Development and Advantages of Step-and-Flash Lithography, Solid State Technology, Jul. 1, 2001.
Colburn et al., Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers, Journal of Vacuum Science Technology. vol. b. 19(6), Nov. 1, 2001.
Bailey et al., Step and Flash Imprint Lithography: Defect Analysis, Journal of Vacuum Science, B 19(6), pp. 2806-2810, Nov. 1, 2001.
Bailey et al., Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis, Journal of Vacuum Science, B 18(6), pp. 3572-3577, Nov. 1, 2000.
Schneider et al., Stripes of Partially Fluorinated Alkyl Chains: Dipolar Langmuir Monolayers, (undated).
Shibuichi et al., Super Water- and Oil-Repellent Surfaces Resulting from Fractal Structure, Journal of Collold and Interface Science, vol. 208, No. 1, pp. 287-294 Dec. 1, 1998.
U.S. Appl. No. 11/126,946, naming Inventors Choi et al., entitled Formation of Discontinuous Films During an Imprint Lithography Process, filed May 11, 2005.
U.S. Appl. No. 11/127,041. naming Inventors Sreenivasan et al., entitled Step and Repeat Imprint Lithography Processes, filed May 11, 2005.
U.S. Appl. No. 11/127,060, naming Inventors Sreenivasan et al., entitled Step and Repeat Imprint Lithography Systems, filed May 11, 2005.
Cowie, “Polymers: Chemistry and Physics of Modern Materials,” 1991, pp. 408-409, 2ndEd, Chapman and Hall, a division of Routledge, Chapman and Hall, Inc., 29 West 35thStreet, NY, NY 10001-2291.
Krug et al., “Fine Patterning of Thin Sol-Gel Films,” Journal of Non-Crystalline Solids, 1992, pp. 447-450, vol. 147 & 148.
Kotachi
Choi Byung-Jin
Sreenivasan Sidlgata V.
Watts Michael P. C.
Fish & Richardson P.C.
Molecular Imprints, Inc.
Tentoni Leo B
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