Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-08-30
1992-05-05
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, 2041801, G01N 2726, B01D 5702
Patent
active
051104393
ABSTRACT:
A polyacrylamide gel electrophoresis column includes a fused-silica tube, a polyacrylamide gel matrix and a polydimethysiloxane layer radially between and covalently attached to both the tube and the gel matrix. The method for forming this column involves covalently binding polyorganosiloxane to the inner wall of the tube, covalently attaching organosilane termini to the organosiloxane layer, and polymerizing acrylamide so as to incorporate the organosilane termini into the resulting polyacrylamide gel matrix. Buffer ions are then drawn into the column under an electric field of about 1000 volts per centimeter, and, at the same time, different reaction product ions are removed. The polyorganosiloxane layer stretches as the polyacrylamide shrinks during polymerization so that the organosiloxane is at least twice as thick as it would be without the gel matrix attached. The process yields a gel matrix which is securely attached to the tube, void-free, and under minimal mechanical stress. As a result, the column can withstand relatively high-voltage pre-electrophoresis and electrophoresis procedures.
REFERENCES:
patent: 4865706 (1989-09-01), Karger et al.
patent: 4865707 (1989-09-01), Karger et al.
patent: 4997537 (1991-03-01), Karger et al.
R. Anderson, Barry Arkles, and G. L. Larson, "Silicon Compounds Register and Review," Petrarch Systems Catalog (Bristol, Pa., 1987), pp. 54 and 266. The pages do not mention use in an electrophoretic column.
Hewlett--Packard Company
Niebling John
Starsiak Jr. John S.
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