Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-01-19
1996-01-09
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 2041828, 356344, C25B 900
Patent
active
054826080
ABSTRACT:
A system for controlling the bulk flow rate in capillary electrophoresis employs pressure to increase velocity without unacceptably increasing plate height. Thus, the system controls bulk flow over a range of velocities, independent of the chemistry of the system. Additionally, the use of pressure under certain conditions may decrease plate height and improve resolution.
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patent: 5302264 (1994-04-01), Welch et al.
Ravindra Datta, Veerabhadra R. Kota Marthi, "Electrokinetic Dispersion In Capillary Electrophoresis," Jun. 1990, vol. 36, No. 6, pp. 916-926.
CA 113 (23): 207828y, Single-stranded RNA molecular weight and shape determination by differential pressure capillary viscometry, sedimentation velocity, and gel electrophoresis.
CA 113 (26): 238658x, High Pressure and Super-critical Capillary Electrophoresis.
Everaerts et al., Journal of Chromotography, 60:397-405 (1971).
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Holloway Robert R.
Keely Catherine A.
McManigill Douglass
Hewlett -Packard Company
Muirheid C. Delacroix
Niebling John
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