Capillary drying of substrates

Details Capillary drying of substrates Capillary drying of substrates

2005-06-21

2005-06-21

Gulakowski, Randy (Department: 1746)

Cleaning and liquid contact with solids

Processes

Work handled in bulk or groups

C134S002000, C134S006000, C134S018000, C134S025400, C134S025500, C134S095200, C134S104200, C134S137000

Reexamination Certificate

active

06907890

ABSTRACT:
An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of removing liquid from a wet substrate in a process tank comprising contacting the wet substrate with capillary material. In another aspect, the invention is a method of drying at least one substrate having a surface in a process tank comprising: submerging the substrate in a liquid having a liquid level; supporting the submerged substrates in the process tank; supplying a drying vapor above the liquid level; lowering the liquid level or raising the substrate so that the liquid level is below the substrate, thereby removing a major portion of liquid from the substrate surface; and removing remaining liquid from the substrate surface with capillary material.

REFERENCES:
patent: 4318749 (1982-03-01), Mayer
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5571337 (1996-11-01), Mohindra et al.
patent: 6125554 (2000-10-01), Munakata
patent: 6254155 (2001-07-01), Kassir
patent: 6488040 (2002-12-01), de Larios et al.

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