Capacitor with integral discharge resistor and method of manufac

Electricity: electrical systems and devices – Electrostatic capacitors – With protection or compensating means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29 2542, H01G 111, H01G 438

Patent

active

044438290

ABSTRACT:
In a capacitor of the wound metallized dielectric type, a section of resistive material is provided on a film forming the metallized dielectric, and this resistive material extends across the film's entire width (the axial dimension of the capacitor). A metal contact for one of the capacitor plates is sprayed on either end of the capacitor so as to touch one end of the section of resistive material, thereby creating a resistive shunt across the plates formed on the metallized film. The section of resistive material is preferably carbon-loaded paper which is secured over an unmetallized area to the film used to make the capacitor. The paper projects beyond either lateral edge of the film so that spraying metal on the ends of the capacitor causes the ends of the paper to be connected to respective capacitor plates.

REFERENCES:
patent: 1952925 (1934-03-01), Kopinski
patent: 2842653 (1958-07-01), Clemons
patent: 2858492 (1958-10-01), Lamphier
patent: 3034198 (1962-05-01), Rayburn et al.
patent: 3840787 (1974-10-01), Grahame
patent: 4028595 (1977-06-01), Stockman
patent: 4368407 (1983-01-01), Wroblewski

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Capacitor with integral discharge resistor and method of manufac does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Capacitor with integral discharge resistor and method of manufac, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Capacitor with integral discharge resistor and method of manufac will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-98340

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.