Capacitor element with an opening portion formed in a...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257S315000, C257S510000, C438S393000

Reexamination Certificate

active

06921960

ABSTRACT:
A semiconductor device includes a structure in which a first electrode layer, an inter-electrode insulating film and a second electrode layer are laminated in a main circuit in this order, and includes a capacitor element having a lower electrode formed of the same layer as the first electrode layer, a charge storage layer formed of the same layer as the inter-electrode insulating film, and an upper electrode formed of the second electrode layer. The semiconductor device further includes an opening portion formed in the charge storage layer, the opening portion having a bottom to which the lower electrode is exposed, and a first region electrically connected to the lower electrode via the opening portion and electrically isolated from the upper electrode, the first region being formed of the same layer as the second electrode layer.

REFERENCES:
patent: 5879983 (1999-03-01), Segawa et al.
patent: 5894147 (1999-04-01), Cacharelis
patent: 5946230 (1999-08-01), Shimizu et al.
patent: 6174822 (2001-01-01), Nagano et al.
patent: 6239462 (2001-05-01), Nakao et al.
patent: 6291307 (2001-09-01), Chu et al.
patent: 2000-150789 (2000-05-01), None
patent: 2000-223570 (2000-08-01), None

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