Metal working – Electric condenser making – Solid dielectric type
Reexamination Certificate
2007-04-27
2010-11-16
Banks, Derris H (Department: 3729)
Metal working
Electric condenser making
Solid dielectric type
C029S025410, C029S830000, C029S842000, C029S846000, C029S847000, C174S260000, C174S261000, C174S262000, C174S263000, C361S300000, C361S306300, C427S079000
Reexamination Certificate
active
07832069
ABSTRACT:
A capacitor device includes a capacitor Q constituted by a lower electrode (12) formed on a substrate (10), a dielectric film (14), and an upper electrode (16); an insulating film (18) covering the capacitor Q; a first contact hole (18a) formed in the insulating film (18) on a connection portion (16a) of the upper electrode (16); an electrode pad (20) for preventing a diffusion of solder, formed in the first contact hole (18a); and a solder bump (22) electrically connected to the electrode pad (20), and the upper electrode (16) has a protrusion portion (16a) protruding from the dielectric film (14), and is connected to the first contact hole (18a) on the protrusion portion (16a).
REFERENCES:
patent: 6266227 (2001-07-01), Konushi et al.
patent: 6333857 (2001-12-01), Kanbe et al.
patent: 6479615 (2002-11-01), Fukuoka et al.
patent: 6573584 (2003-06-01), Nagakari et al.
patent: 6624501 (2003-09-01), Shioga et al.
patent: 6754950 (2004-06-01), Furukawa et al.
patent: 6794481 (2004-09-01), Amagai et al.
patent: 6937458 (2005-08-01), Seshan
patent: 2002/0177298 (2002-11-01), Konishi et al.
patent: 2003/0071300 (2003-04-01), Yashima et al.
patent: 55-166947 (1980-12-01), None
patent: 10-335182 (1998-12-01), None
patent: 2000-244130 (2000-09-01), None
patent: 2000-340456 (2000-12-01), None
patent: 2001-185444 (2001-07-01), None
patent: 2002-164258 (2002-06-01), None
patent: 2002-222925 (2002-08-01), None
patent: 2002-231577 (2002-08-01), None
Office Action dated Apr. 8, 2008 issued in corresponding Japanese U.S. Appl. No. 2002-238455.
Baniecki John David
Kurihara Kazuaki
Shioga Takeshi
Banks Derris H
Fujitsu Limited
Parvez Azm
Westerman Hattori Daniels & Adrian LLP
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