Capacitor constructions having silicon nitride dielectric materi

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

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Details

3613215, 361322, 438239, 438251, 257310, H01G 406, H01G 410, H01G 412

Patent

active

061117447

ABSTRACT:
The invention includes a capacitor. The capacitor has a first conductive capacitor electrode, a second conductive capacitor electrode, and a capacitor dielectric material intermediate the first and second capacitor electrodes. The dielectric material contacts both of the first and second capacitor electrodes. All of the dielectric material intermediate the first and second capacitor plates consists of silicon nitride.

REFERENCES:
patent: 4254161 (1981-03-01), Kemlage
patent: 4882649 (1989-11-01), Chen et al.
patent: 4891684 (1990-01-01), Nishioka et al.
patent: 4996081 (1991-02-01), Ellul et al.
patent: 5051794 (1991-09-01), Mori
patent: 5142438 (1992-08-01), Reinberg et al.
patent: 5324679 (1994-06-01), Kim et al.
patent: 5376593 (1994-12-01), Sandhu et al.
patent: 5498890 (1996-03-01), Kim et al.
patent: 5504029 (1996-04-01), Murata et al.
patent: 5508542 (1996-04-01), Geiss et al.
patent: 5523596 (1996-06-01), Ohi et al.
patent: 5731235 (1998-03-01), Srinivasan et al.
patent: 5844771 (1998-12-01), Graettinger et al.
patent: 5851603 (1998-12-01), Tsai et al.
patent: 6001718 (1999-12-01), Tanaka et al.

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