Capacitive resonators and methods of fabrication

Details Capacitive resonators and methods of fabrication Capacitive resonators and methods of fabrication

2006-04-04

2006-04-04

Kang, Donghee (Department: 2811)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

C257S415000, C257S416000, C257S417000, C438S022000, C438S050000, C438S052000, C438S053000

Reexamination Certificate

active

07023065

ABSTRACT:
A micro-electro-mechanical system (MEMS) capacitive resonator and methods for manufacturing the same are invented and disclosed. In one embodiment, a method comprises forming trenches in a substrate, conformally coating the substrate with an oxide, filling the coated trenches with polysilicon, patterning the polysilicon, releasing a resonating structure derived from the substrate, and removing the conformally coated oxide.

REFERENCES:
patent: 3513356 (1970-05-01), Newell
patent: 3634787 (1972-01-01), Newell
patent: 5162691 (1992-11-01), Mariani et al.
patent: 5426070 (1995-06-01), Shaw et al.
patent: 5491604 (1996-02-01), Nguyen et al.
patent: 5587620 (1996-12-01), Ruby et al.
patent: 5589082 (1996-12-01), Lin et al.
patent: 5663505 (1997-09-01), Nakamura
patent: 5719073 (1998-02-01), Shaw et al.
patent: 5846849 (1998-12-01), Shaw et al.
patent: 5847454 (1998-12-01), Shaw et al.
patent: 5873153 (1999-02-01), Ruby et al.
patent: 5884378 (1999-03-01), Dydyk
patent: 5894647 (1999-04-01), Lakin
patent: 5914801 (1999-06-01), Dhuler et al.
patent: 5976994 (1999-11-01), Nguyen et al.
patent: 5998906 (1999-12-01), Jerman et al.
patent: 6000280 (1999-12-01), Miller et al.
patent: 6051866 (2000-04-01), Shaw et al.
patent: 6060818 (2000-05-01), Ruby et al.
patent: 6067858 (2000-05-01), Clark et al.
patent: 6087747 (2000-07-01), Dhuler et al.
patent: 6121552 (2000-09-01), Brosnihan et al.
patent: 6134042 (2000-10-01), Dhuler et al.
patent: 6215375 (2001-04-01), Larson, III et al.
patent: 6236281 (2001-05-01), Nguyen et al.
patent: 6238946 (2001-05-01), Ziegler
patent: 6239536 (2001-05-01), Lakin
patent: 6256134 (2001-07-01), Dhuler et al.
patent: 6275122 (2001-08-01), Speidell et al.
patent: 6275320 (2001-08-01), Dhuler et al.
patent: 6291931 (2001-09-01), Lakin
patent: 6296779 (2001-10-01), Clark et al.
patent: 6348846 (2002-02-01), von Gutfeld et al.
patent: 6373682 (2002-04-01), Goodwin-Johansson
patent: 6377438 (2002-04-01), Deane et al.
patent: 6391674 (2002-05-01), Ziegler
patent: 6413793 (2002-07-01), Lin et al.
patent: 6428713 (2002-08-01), Christenson et al.
patent: 6429755 (2002-08-01), Speidell et al.
patent: 6433401 (2002-08-01), Clark et al.
patent: 6480645 (2002-11-01), Peale et al.
patent: 6485273 (2002-11-01), Goodwin-Johansson
patent: 6495892 (2002-12-01), Goodman et al.
patent: 6497141 (2002-12-01), Turner et al.
patent: 6555201 (2003-04-01), Dhuler et al.
patent: 2003/0006468 (2003-01-01), Ma et al.
Farrokh Ayazi et al. “High Aspect-Ratio Combined Poly and Single-Crystal Silicon (HARPSS) MEMS Technology”, J. of Microelectromechanical Systems, vol. 9, No. 3, Sep. 2000.
No et al., “The HARPSS Process for Fabrication of Nano-Precision Silicon Electromechanical Resonators”, IEEE Conf. of Nanotechnology, pp 489-494, Oct. 30, 2001.
Ayazi, et al.; Piezoelectric On Semiconductor-On-Insulator Microelectromechanical Resonators And Methods Of Fabrication; U.S. Appl. No. 10/631,948; filed Jul. 31, 2003.
Bourgeois, et al.; Design of Resonators for the Determination of the Temperature Coefficients of Elastic Constants of Monocrystalline Silicon; 1997 IEEE International Frequency Control Symposium; Orlando, FL.; pp. 791-799.
Mihailovich, et al.; Dissipation Measurements of Vacuum-Operated Single-Crystal Silicon Microresonators, Sensors and Actuators A 50 (1995); pp. 199-207.
Roszhart, et al.; The Effects of Thermoelastic Internal Friction on the Q of Micromachined Silicon Resonators; IEEE Solid State Sensor and Actuator Workshop, Hilton Head, SC 6/4-7/90 (1990) pp 489-494.
Cleland, et al.; Fabrication of High Frequency Nanometer Scale Mechanical Resonators from Bulk Si Crystals; Condensed Matter Physics, CA Inst. of Tech.; Received Jun. 21, 1996, pp. 2653-2655.
No, et al.; The HARPSS Process for Fabrication of Nano-Precision Silicon Electromechanical Resonators; IEEE Conf. of Nanotechology; Oct. 30, 2001; pp. 489-494.
Water, et al.; “Physical and Structural Properties of ZnO Sputtered Films”; Dept. of EE, National Cheng Kung University; Received May 7, 2001; pp. 67-72.
Bhave, et al.; Poly-Sige: A High-Q Structural Material for Integrated RF Mems; Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Island, South Carolina, Jun. 2-6, 2002; pp 34-37.
Hsu, et al.; Q Optimized Lateral Free-Free Beam Micromechanical Resonators; Digest of Technical Papers, The 11thInt. Conf. On Solid-State Sensors & Actuators (Transducers'01), Munich, Germany, Jun. 10-14, 2001, pp. 1110-1113.
Yasumura, et al.; Quality Factors in Micron- and Submicron—Thick Cantilevers; Journal of Microelectromechanical Systems, vol. 9, No. 1, Mar. 2000; pp 117-125.
Peterson, et al.; Resonant Beam Pressure Sensor Fabricated With Silicon Fusion Bonding; 6th Int. Conference on Solid State Sensors and Actuators (Transduces '91), San Francisco, CA; 1991; pp 664-667.
Abdelmoneum, et al.; Stemless Wine-Glass Mode Disk Micromechanical Resonators; IEEE; 2003; pp 698-701.
Piekarski, et al; Surface Micromachined Piezoelectric Resonant Beam Filters; Sensors and Actuators, A 91; 2001; pp 313-320.
Lifshitz, et al.; Thermoelastic Damping In Micro- and Nanomechanical Systems; Physical Review B; vol. 61, No. 8; Feb. 15, 2000; pp 5600-5609.
Srikar, et al.; Thermoelastic Damping In Fine-Grained Polysilicon Flexural Beam Resonators; Journal of Microelectromechanical Systems, vol. 11, No. 5; Oct., 2002; pp 499-504.
Lakin; Thin Film Resonators and Filters; IEEE Ultrasonics Symposium; 1999; pp 895-906.
Ruby, et al.; Ultra-Miniature High-Q Filters and Duplexers Using FBAR Technology; IEEE International Solid-State Circuits Conference; 2001; pp 120-121 & 438.
Clark, et al.; High-Q VHF Micromechanical Contour-Mode Disk Resonators; IEEE; 2000; pp 493-496.
Wang, et al.; VHF Free-Free Beam High-Q Micromechanical Resonators; Journal of Microelectromechanical Systems, vol. 9, No. 3; Sep. 2000; pp 347-360.
Piazza, et al.; Voltage-Tunable Piezoelectrically-Transduced Single-Crystal Silicon Resonators on SOI Substrate; in Proc. IEEE Internatinal Microelectro Mechanical Systems Conference (MEMs '03), Koyoto, Japan, Jan. 2003.
Pourkamali, et al.; A 600kHz Electrically-Coupled MEMs Bandpass Filter; MEMs '03, pp. 702-705.
Pourkamali, et al.; SOI-Based HF and VHF Single-Crystal Silicon Resonators With SUB-100 Nanometer Vertical Capacitive Gaps; Transducers '03, Boston, MA; Jun. 2003.
No, et al.; Single-Crystal Silicon HARPSS Capacitive Resonators With Submicron Gap-Spacing; Solid State Sensors, Actuators and Microsystems Workshop; pp. 281-284, Hilton Head, SC; Jun. 2002.
Amini, et al.; Capacitive Accelerometer; IEEE International Solid-State Circuits Conference; 2000; pp 1-3.
Ho, et al.; Through-Support-Coupled Micromechanical Filter Array; School of Electrical and Computer Engineering; Proc. IEEE International Micro Electro Mechanical Systems Conference (MEMS'04), Maastricht, The Netherlands, Jan. 2004, pp769-772.
Pourkamali, et al.; Fully Single Crystal Silicon Resonators With Deep-Submicron Dry-Etched Transducer Gaps; Proc. IEEE International Micro Electro Mechanical Systems Conference (MEMS '04), The Netherlands, Jan. 2004, pp 813-816.
Pourkamali, et al.; Electrostatically Coupled Micromechanical Beam Filters; Proc. IEEE International Micro Electro Mechanical Systems Conference (MEMS '04), The Netherlands, Jan. 2004, pp. 584-587.
Amini, et al.; A High Resolution, Stictionless, CMOS Compatible SOI Accelerometer with a Low Noise, Low Power, 0.25 μm CMOS Interface; IEEE MEMS'04, Jan. 2004, pp. 572-575.
Humad, et al.; High Frequency Micromechanical Piezo-On-Silicon Block Resonators; IEEE; 2003.
Abdolvand, et al.; Thermoelastic Damping in Trench-Refilled Polysilicon Resonators; IEEE; 2003; pp 324-327.
Sundaresan, et al.; A 7-MHz Process, Temperature and Supply Compensated Clock Oscillator in 0.25μm CMOS; Proc. of International Symposium on Circuits and Systems (ISCAS) 2003, vol. 1, pp. 693-696, May 2003.
No, et al.; Single-Crystal Silicon HARPSS Capacitive Resonators With Submicron Gap-Spacing; Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Island, South Car

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