Capacitive pressure sensor

Measuring and testing – Fluid pressure gauge – Diaphragm

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

11107510

ABSTRACT:
A capacitive pressure sensor made up of two silicon on insulator (SOI) wafers lying opposite of each other and joined to each other in a vacuum-tight manner, a recess being formed between the two wafers. The first wafer exclusively supports the evaluation circuits required for measuring the applied pressure and a capacitive electrode, and the second wafer has a recess formed by surface micromechanics processes, in which the counter electrode to the capacitive electrode of the first wafer is situated. The second wafer at the same time forms a cover for the first wafer.

REFERENCES:
patent: 6341527 (2002-01-01), Ishikura et al.
patent: 6382030 (2002-05-01), Kihara et al.
patent: 6968744 (2005-11-01), Silverbrook et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Capacitive pressure sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Capacitive pressure sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Capacitive pressure sensor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3762598

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.