Capacitance-type dynamic-quantity sensor and manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal

Reexamination Certificate

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Details

C257S417000

Reexamination Certificate

active

10848285

ABSTRACT:
A capacitance-type dynamic-quantity sensor has a silicon substrate having etched recessed upper and lower surface portions forming a weight supported by beam portions and mounted to undergo displacement due to an applied external dynamic quantity such as acceleration or angular velocity. An upper glass substrate is bonded to a part of the upper surface of the silicon substrate and is laminated with a first fixed electrode disposed opposite to and spaced apart from the weight with a first space therebetween formed by the etched recessed upper surface portion of the silicon substrate. A lower glass substrate is bonded to a part of the lower surface of the silicon substrate and is laminated with a second fixed electrode disposed opposite to and spaced apart from the weight with a second space therebetween formed by the etched recessed lower surface portion of the silicon substrate.

REFERENCES:
patent: 08-094666 (1996-04-01), None

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