Capacitance height gage applied in reticle position detection sy

Details Capacitance height gage applied in reticle position detection sy Capacitance height gage applied in reticle position detection sy

1983-10-28

1985-08-27

Smith, Alfred E.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 37304

Patent

active

045380694

ABSTRACT:
A method of calibrating a capacitance height gage for an electron beam lithography machine. The electron beam apparatus having the capacitance height gage to be calibrated is first mounted in a calibration fixture wherein the distance between the gage and a calibration reticle is adjusted using a laser interferometer. The electron beam is directed to a center high backscatter point, and then deflected to a predetermined high backscatter point. The capacitance gage readings and deflection voltages are measured to define a calibration plane. The electron beam apparatus is then repositioned to the lithography station having a reticle positioned below the electron beam. The distance to the reticle is measured with the capacitance gage, and the deflection of the electron beam during lithography operations is adjusted according to the variation of the reticle plane from the calibration plane.

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Asai et al., "Distortion Correction . . . ", J. Vac. Sci. Technol., 16(6), Nov./Dec. 1979, pp. 1710-1714.

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