Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-07-29
1993-04-06
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429809, C23C 1435
Patent
active
052000494
ABSTRACT:
An apparatus for rotatably mounting a cylindrical magnetron in a vacuum chamber. The apparatus includes a bearing housing having one end extending into the vacuum chamber with the other end located outside the chamber. A drive shaft is rotatably mounted in the bearing housing. Each end of the drive shaft extends beyond the housing. The cylindrical magnetron is attached to the end of the drive shaft inside the chamber. A vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. The drive shaft is mounted in the housing such that the load of the magnetron is not transferred to the vacuum seal.
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"Design Advances and Applications of the Rotatable Magnetron," Proceedings of the 32nd National Symposium of the American Vacuum Society, vol. 4, No. 3, Part 1, pp. 388-392 (1986).
"Recent Advances in the Design and Application of the Rotatable Cylindrical Magnetron," Wright, M., et al., Annual Technical Conference, Society of Vacuum Coaters (1986).
Bjornard Erik J.
Humberstone Geoffrey H.
Stevenson David E.
Viratec Thin Films, Inc.
Weisstuch Aaron
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