Calibration wafer for a stepper

Details Calibration wafer for a stepper Calibration wafer for a stepper

2006-05-30

2006-05-30

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C438S014000, C438S016000, C438S401000, C430S022000, C355S053000, C355S077000

Reexamination Certificate

active

07054007

ABSTRACT:
There is a method for manufacturing wafers. In an example embodiment, the method employs a stepper with a reticle, lens, and stage movement parameters that comprise providing a set of intentionally-misaligned calibration wafers with predetermined input corrections, the input corrections accounting for linearity of response and interactions between the reticle, lens and stage movement parameters of the stepper. The stepper is calibrated by using the predetermined input corrections from the set of intentionally misaligned calibration wafers. Using the calibrated stepper, aligned patterns on the wafers are printed.

REFERENCES:
patent: 6258611 (2001-07-01), Leroux
patent: 6716649 (2004-04-01), Ziger
U.S. Appl. No. 09/826,839, filed Apr. 6, 2001, David Ziger.
U.S. Appl. No. 10/117,924, filed Apr. 5, 2002, David Ziger.
U.S. Appl. No. 09/422,914, filed Oct. 21, 1999, Pierre Leroux.
U.S. Appl. No. 09/422,909, filed Oct. 21, 1999, Pierre Leroux.

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