Calibration patterns and techniques for charged particle project

Details Calibration patterns and techniques for charged particle project Calibration patterns and techniques for charged particle project

1997-01-23

1998-06-09

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504911, 2502521, H01J 37304

Patent

active

057638942

ABSTRACT:
A method and system for calibrating a projection electron beam. The electron beam is directed through a first mask pattern and onto a first calibration plate. The electron beam is directed through a second mask pattern and onto a second calibration plate. The first mask pattern and the first calibration plate are used to adjust the orientation of the electron beam, and the second mask pattern and the second calibration plate are used to adjust the magnification of the electron beam.

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