Calibration method, inspection method, and semiconductor...

Details Calibration method, inspection method, and semiconductor... Calibration method, inspection method, and semiconductor...

2011-07-12

2011-07-12

Chawan, Sheela C (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C382S149000, C382S151000, C702S085000, C703S013000

Reexamination Certificate

active

07978902

ABSTRACT:
According to an aspect of the invention, there is provided a calibration method of performing contrast threshold calibration in extracting a pattern edge from an image of a pattern formed on a processing target substrate, including simulating formation of the pattern to detect a portion predicted to have shorted or opened in the pattern, calculating a contrast of an image of the pattern including the portion predicted to have shorted or opened, and determining a threshold from the contrast, the threshold avoiding extraction of a pattern edge in the portion predicted to have shorted or opened.

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patent: 7221788 (2007-05-01), Schulze et al.
patent: 7241993 (2007-07-01), Nakasuji et al.
patent: 7280945 (2007-10-01), Weiner et al.
patent: 7523027 (2009-04-01), Chang et al.
patent: 9-312318 (1997-12-01), None

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