Calibration apparatus for capacitance height gauges

Measuring and testing – Instrument proving or calibrating – Volume of flow – speed of flow – volume rate of flow – or mass...

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324 61R, 324 74, 356356, G01B 2116

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active

045398356

ABSTRACT:
In an electron beam lithography apparatus a capacitance height gauge is used to determine the distance between a reticule and electron optics. In order to calibrate the capacitance gauge an optical interferometer, including a mirror are mounted on the same axis as the capacitance gauge. The mirror is moved a predetermined distance so that the movement distance measured by the capacitance gauge and the interferometer can be compared.

REFERENCES:
patent: 3409774 (1968-11-01), Dykeman
patent: 3523735 (1970-08-01), Taylor
patent: 3986109 (1976-10-01), Poduje
patent: 4461569 (1984-07-01), Corbett

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