Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2008-01-17
2011-11-15
Mariam, Daniel (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S144000
Reexamination Certificate
active
08059885
ABSTRACT:
A method, system, computer program product and table lookup system for calculating image intensity for a mask used in integrated circuit processing are disclosed. A method may comprise: decomposing a Manhattan polygon of the mask into decomposed areas based on parallel edges of the Manhattan polygon along only one dimension; determining a convolution of each decomposed area based on a table lookup; determining a sum of coherent systems contribution of the Manhattan polygon based on the convolutions of the decomposed areas; and outputting the determined sum of coherent system contribution for analyzing the mask.
REFERENCES:
patent: 7079223 (2006-07-01), Rosenbluth et al.
patent: 7155698 (2006-12-01), Gennari
patent: 2004/0122636 (2004-06-01), Adam
patent: 2006/0009957 (2006-01-01), Kohle
patent: 2006/0126046 (2006-06-01), Hansen
patent: 2006/0248498 (2006-11-01), Sezginer et al.
Adam, “Modeling of Electromagnetic Effects from Mask Topography at Full-Chip Scale”, Proceedings of SPIE, vol. 5754, 2005, pp. 498-505.
Bai et al., “Approximation of Three-Dimensional Mask Effects with Two-Dimensional Features”, Proceedings of SPIE, vol. 5751, 2005, pp. 446-454.
Erdmann, “Mask Modeling in the Low K1 and Ultrahigh NA Regime: Phase and Polarization Effect”, Proceedings of SPIE, vol. 5835, 2005, pp. 69-81.
Lam et al., “Domain decomposition methods for simulation of printing and inspection of phase defects”, Proceedings of SPIE, vol. 5040, 2003, pp. 1492-1501.
Tirapu-Azpiroz et al., “Boundary Layer Model to Account for Thick Mask Effects in PhotoLithography”, Proceedings of SPIE, vol. 5040, 2003, pp. 1611-1619.
Lai Kafai
Melville David O. S.
Rosenbluth Alan E.
Tian Kehan
Tirapu-Azpiroz Jaione
Cal Yuanmin
Hoffman Warnick LLC
International Business Machines - Corporation
Mariam Daniel
LandOfFree
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